| 摘要 |
A processing liquid having a predetermined pH in the range of 5 to 9 is generated, and a substrate on which metal is exposed is processed by using the processing liquid. The substrate liquid processing method includes: a processing liquid generation process which generates the processing liquid including pure water, carbon dioxide, and ammonia and having the predetermined pH in the range of 5 to 9; and a liquid processing process which processes the substrate by using the generated processing liquid. |
