| 摘要 |
PROBLEM TO BE SOLVED: To provide a sewing machine which can automatically project a mark onto a projection position corresponding to the sewing position of each pattern when sewing a plurality of patterns on a work cloth.SOLUTION: A CPU acquires an amount DF of movement which is a displacement between the position of a center line 181C of a first pattern 181 sewn on a work cloth 96 and the position of a center line 182C of a second pattern 182 sewn thereon. The CPU determines a distance difference LE which is a difference between the position of the center line 181C of the first pattern 181 and a needle location 181L at a left end. The CPU subtracts the distance difference LE from the amount DF of movement to calculate an offset amount OF. When the second pattern 182 is sewn, the CPU projects a mark 95 onto a position according to the offset amount OF. Sewing is performed while the left end of the first pattern 181 already sewn is aligned with the mark 95. Thereby, the second pattern 182 can be sewn at a position as intended with respect to the first pattern 181.SELECTED DRAWING: Figure 10 |
