QUALITY EVALUATION METHOD OF OXIDE SEMICONDUCTOR THIN FILM AND LAMINATE HAVING PROTECTION FILM ON SURFACE OF OXIDE SEMICONDUCTOR THIN FILM, AND QUALITY CONTROL METHOD OF OXIDE SEMICONDUCTOR THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a method of correctly and simply evaluating quality of an oxide semiconductor thin film and a laminate having a protection film on a surface of the oxide semiconductor thin film, and a quality control method of the oxide semiconductor film.SOLUTION: A quality evaluation method of an oxide semiconductor thin film and a laminate having a protection film on a surface of the oxide semiconductor thin film comprises: a first step of evaluating fault caused by defects in the oxide semiconductor thin film by measuring an electronic state of the oxide semiconductor thin film by a contact method or a non-contact method after the oxide semiconductor thin film is formed on a substrate; and a second step of evaluating fault caused by defects in an interface of the oxide semiconductor thin film and the protection film by measuring an electronic state of the oxide semiconductor thin film by a contact method or a non-contact method after the protection film is formed on the surface of the oxide semiconductor thin film processed under a condition determined based on the evaluation by the first step.SELECTED DRAWING: Figure 17A