| 主权项 |
1. A system, comprising:
a projection exposure apparatus, comprising:
a projection optical unit configured to image an object field into an image field; andan illumination system configured to guide illumination light toward the object field, wherein the projection exposure apparatus is configured so that, during operation of the projection exposure apparatus:
the illumination light at the object field has a scan-integrated intensity distribution in a direction perpendicular to a scan direction and a scan-integrated direction distribution in the direction orthogonal to the scan direction;mask structures of the lithography mask are imaged to provide substrate structures on a substrate in the image field;a size of the mask structures at defined mask design locations is based on an intensity distribution of the illumination light at the object field and from a direction distribution of the illumination light at the object field; andthe size of a mask structure between the mask design locations is given by a sum of an interpolation of the values of the sizes of the mask structures at the mask design locations plus a term which, apart from a proportionality factor, is given by the profile of the scan-integrated intensity distribution. |
