发明名称 |
METHOD AND APPARATUS FOR INSPECTING PROCESS SOLUTION, AND SAMPLE PREPARATION APPARATUS IN INSPECTION |
摘要 |
A method for inspecting a process solution is provided. In this method, a process solution is disposed on a surface of a substrate. A liquid of the process solution is removed to form an inspection sample by a spinning method. The surface of the substrate of the inspection sample is inspected by the surface inspection device to identify whether a residue of the process solution is left on the surface of the substrate after removing the liquid of the process solution. Further, an apparatus for inspecting a process solution and a sample preparation apparatus in inspection are also provided herein. |
申请公布号 |
US2016061695(A1) |
申请公布日期 |
2016.03.03 |
申请号 |
US201414475164 |
申请日期 |
2014.09.02 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHUANG Tzu-Sou;KUO Chi-Wen |
分类号 |
G01N1/28;G01Q60/24;G01N27/02;G01N27/72;G01Q60/38;G01Q60/46;G01Q60/50;G01Q60/26;G01Q60/30;G01N21/65;G01B5/00 |
主分类号 |
G01N1/28 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method for inspecting a process solution, comprising:
applying the process solution on a surface of a substrate; removing a liquid of the process solution by a spinning process to form an inspection sample; and identifying whether a residue of the process solution is left on the surface of the substrate by a surface inspection device. |
地址 |
Hsinchu TW |