发明名称 METHOD AND APPARATUS FOR INSPECTING PROCESS SOLUTION, AND SAMPLE PREPARATION APPARATUS IN INSPECTION
摘要 A method for inspecting a process solution is provided. In this method, a process solution is disposed on a surface of a substrate. A liquid of the process solution is removed to form an inspection sample by a spinning method. The surface of the substrate of the inspection sample is inspected by the surface inspection device to identify whether a residue of the process solution is left on the surface of the substrate after removing the liquid of the process solution. Further, an apparatus for inspecting a process solution and a sample preparation apparatus in inspection are also provided herein.
申请公布号 US2016061695(A1) 申请公布日期 2016.03.03
申请号 US201414475164 申请日期 2014.09.02
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHUANG Tzu-Sou;KUO Chi-Wen
分类号 G01N1/28;G01Q60/24;G01N27/02;G01N27/72;G01Q60/38;G01Q60/46;G01Q60/50;G01Q60/26;G01Q60/30;G01N21/65;G01B5/00 主分类号 G01N1/28
代理机构 代理人
主权项 1. A method for inspecting a process solution, comprising: applying the process solution on a surface of a substrate; removing a liquid of the process solution by a spinning process to form an inspection sample; and identifying whether a residue of the process solution is left on the surface of the substrate by a surface inspection device.
地址 Hsinchu TW