METHOD FOR MANUFACTURING A CARBON-CONTAINING PROTECTIVE FILM

摘要

A method for manufacturing a protective film having a smaller thickness that none-the-less suppresses degradation of the protective film and maintains corrosion resistance is achieved. The method for manufacturing a carbon-containing protective film includes: (a) forming a carbon material film on a substrate by a plasma CVD method using a starting material gas containing a hydrocarbon gas; and (b) nitriding the carbon material film by using plasma generated from a nitrogen-containing starting material gas in a plasma CVD device having an anode and a cathode, to form the carbon-containing protective film. During nitriding, an anode potential may be equal to or greater than 20 V, an ion acceleration potential difference may be within a range of 20 V to 120 V, and a substrate current density may be within a range of 4×10−6 A/mm2 to 8×10−6 A/mm2.

主权项

1. A method for manufacturing a carbon-containing protective film, the method comprising:
(a) forming a carbon material film on a substrate by a plasma CVD method using a starting material gas containing a hydrocarbon gas; and (b) nitriding the carbon material film by using plasma generated from a nitrogen-containing starting material gas in a plasma CVD device having an anode and a cathode, to form the carbon-containing protective film under conditions including an anode potential equal to or greater than 20 V, an ion acceleration potential difference within a range of 20 V to 120 V, and a substrate current density within a range of 4×10−6 A/mm2 to 8×10−6 A/mm2.