| 发明名称 |
PHOTO SENSOR AND MANUFACTURING METHOD THEREOF |
| 摘要 |
A photo sensor according to an embodiment includes a semiconductor substrate. A plurality of photodiodes are provided on a first surface of the semiconductor substrate. A plurality of photodetective filters corresponding to the photodiodes are provided on a second surface of the semiconductor substrate opposite to the first surface. A plurality of lenses correspond to the photodetective filters so as to respectively cover the photodetective filters. Protruding portions protrude on the second surface between adjacent ones of the photodetective filters. |
| 申请公布号 |
US2016064435(A1) |
申请公布日期 |
2016.03.03 |
| 申请号 |
US201514613932 |
申请日期 |
2015.02.04 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
YABUKI Moto |
| 分类号 |
H01L27/146 |
主分类号 |
H01L27/146 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A photo sensor comprising:
a semiconductor substrate; a plurality of photodiodes on a first surface of the semiconductor substrate; a plurality of photodetective filters corresponding to the photodiodes on a second surface of the semiconductor substrate opposite to the first surface; a plurality of lenses corresponding to the photodetective filters so as to respectively cover the photodetective filters; and protruding portions protruded on the second surface between adjacent ones of the photodetective filters. |
| 地址 |
Tokyo JP |
