| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad with excellent polishing speed stability, and to provide a method of manufacturing the polishing pad.SOLUTION: The polishing pad includes a polishing layer composed of a polyurethane resin foam obtained by a mechanical foaming method. The polyurethane resin foam is a reaction cured body of a polyurethane raw material composition containing: an isocyanate-terminal prepolymer containing isocyanate component, a high-molecular-weight polyol, and a polysiloxane group-containing diol represented by following general formula (1); and a chain extender. The content of the polysiloxane group-containing diol is 1-5 wt.% in the polyurethane raw material composition. In the formula, Ris a 1-12C alkyl group, n is an integer of 10-380, and m is an integer of 1-12. |
