| 摘要 |
The invention relates to a method of acquiring an Energy Backscattering Pattern (EBSP) image of a sample (126) in a charged particle apparatus, the sample showing a flat surface, the charged particle apparatus equipped with an electron column (110) for producing a finely focused electron beam, a position sensitive detector (128) for detecting EBSP patterns, and a sample holder (124) for holding and positioning the sample, the method comprising the steps of:
€¢ Positioning the sample with respect to the electron beam,
€¢ Directing the electron beam to an impact point on the sample, thereby causing backscattered electrons to irradiate the detector, and
€¢ Acquiring the signal from the detector while the beam is kept stationary, Characterized in that
€¢ The detector is equipped to selectively detect electrons with an energy above a predefined threshold, and
€¢ The signal of the electrons with an energy above said threshold is used to form an EBSP image. Inventors found surprisingly that this energy filtered signal acquired in low tilt configuration enables EBSP imaging with significantly improved resolution and better contrast of formed Kikuchi lines. This is contrary to the already long existing prejudice that only by a beam impinging on the sample at a large angle from the normal to the sample (thus: almost glancing) results in a good image. |
