METHOD OF CALCULATING AMOUNT OF FLUCTUATION OF IMAGING CHARACTERISTIC OF PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD OF FABRICATING DEVICE

摘要

The present invention relates to a method for calculating an amount of fluctuation in imaging characteristics of a projection optical system, an exposure apparatus, and a method for producing a device. If a substrate is exposed to an exposure light within a first wavelength, the exposure coefficient for the first wavelength range described by the fluctuation of imaging characteristics of the projection optical system per unit exposure energy is calculated using data on the fluctuation in the optical characteristics of the projection optical system. the exposure coefficient for the second wavelength range different from the first wavelength range is calculated using the exposure coefficient for the first wavelength range. If the substrate is exposed to the exposure light within the second wavelength range, the amount of fluctuation of the imaging characteristics of the projection optical system is calculated using the exposure coefficient for the second wavelength range.