发明名称 |
Substrate treating apparatus and substrate treating method |
摘要 |
Provided is an apparatus for treating a substrate using a supercritical fluid. The substrate treating apparatus includes a housing, a support member disposed within the housing to support the substrate, a supercritical fluid supply unit in which the supercritical fluid is stored, a supply tube connecting the supercritical fluid supply unit to the housing to adjust an amount of supercritical fluid supplied from the supercritical fluid supply unit into the housing, and a vent tube branched from the supply tube to discharge the supercritical fluid remaining in the supply tube. A switching valve opening or closing the vent tube is disposed in the vent tube. |
申请公布号 |
US9275852(B2) |
申请公布日期 |
2016.03.01 |
申请号 |
US201313905754 |
申请日期 |
2013.05.30 |
申请人 |
Semes Co., Ltd. |
发明人 |
Kim KiBong;Kim Boong;Song Gil Hun;Kwon Oh Jin |
分类号 |
H01L21/00;B08B3/04;F26B5/00;H01L21/02;F26B21/14;H01L21/67;B08B7/00;F26B21/12 |
主分类号 |
H01L21/00 |
代理机构 |
Harness, Dickey & Pierce |
代理人 |
Harness, Dickey & Pierce |
主权项 |
1. An apparatus for treating a substrate using a supercritical fluid, the apparatus comprising:
a housing; a support member disposed within the housing to support the substrate; a supercritical fluid supply unit in which the supercritical fluid is stored; a supply tube connecting the supercritical fluid supply unit to the housing; and a vent tube branched from the supply tube to discharge the supercritical fluid remaining in the supply tube, wherein a supply valve adjusting an amount of supercritical fluid supplied from the supercritical fluid supply unit into the housing is disposed in the supply tube, wherein a switching valve opening or closing the vent tube is disposed in the vent tube. |
地址 |
Chungcheongnam-do KR |