发明名称 Substrate treating apparatus and substrate treating method
摘要 Provided is an apparatus for treating a substrate using a supercritical fluid. The substrate treating apparatus includes a housing, a support member disposed within the housing to support the substrate, a supercritical fluid supply unit in which the supercritical fluid is stored, a supply tube connecting the supercritical fluid supply unit to the housing to adjust an amount of supercritical fluid supplied from the supercritical fluid supply unit into the housing, and a vent tube branched from the supply tube to discharge the supercritical fluid remaining in the supply tube. A switching valve opening or closing the vent tube is disposed in the vent tube.
申请公布号 US9275852(B2) 申请公布日期 2016.03.01
申请号 US201313905754 申请日期 2013.05.30
申请人 Semes Co., Ltd. 发明人 Kim KiBong;Kim Boong;Song Gil Hun;Kwon Oh Jin
分类号 H01L21/00;B08B3/04;F26B5/00;H01L21/02;F26B21/14;H01L21/67;B08B7/00;F26B21/12 主分类号 H01L21/00
代理机构 Harness, Dickey & Pierce 代理人 Harness, Dickey & Pierce
主权项 1. An apparatus for treating a substrate using a supercritical fluid, the apparatus comprising: a housing; a support member disposed within the housing to support the substrate; a supercritical fluid supply unit in which the supercritical fluid is stored; a supply tube connecting the supercritical fluid supply unit to the housing; and a vent tube branched from the supply tube to discharge the supercritical fluid remaining in the supply tube, wherein a supply valve adjusting an amount of supercritical fluid supplied from the supercritical fluid supply unit into the housing is disposed in the supply tube, wherein a switching valve opening or closing the vent tube is disposed in the vent tube.
地址 Chungcheongnam-do KR