发明名称 |
SUBSTRATE SUPPORT WITH SURFACE FEATURE FOR REDUCED REFLECTION AND MANUFACTURING TECHNIQUES FOR PRODUCING SAME |
摘要 |
Methods and apparatus are provided for reducing the thermal signal noise in process chambers using a non-contact temperature sensing device to measure the temperature of a component in the process chamber. In some embodiments, a susceptor for supporting a substrate in a process chamber includes a first surface comprising a substrate support surface; and a second surface opposite the first surface, wherein a portion of the second surface comprises a feature to absorb incident radiant energy. |
申请公布号 |
SG11201510710T(A) |
申请公布日期 |
2016.02.26 |
申请号 |
SGT11201510710 |
申请日期 |
2014.07.09 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LAU, SHU-KWAN;RANISH, JOSEPH M.;BRILLHART, PAUL;SAMIR, MEHMET TUGRUL |
分类号 |
H01L21/683 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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