EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION METHOD

摘要

This extreme ultraviolet light generation system may be provided with: a chamber; a target supply unit configured to supply a target to a predetermined region in the chamber, said target having an atomic density of 8.0×1017-1.3×1018 atoms/cm3; and a laser device that irradiates the predetermined region with pulsed laser light having an energy density of 10.5-52.3 J/cm2 in the predetermined region.