| 摘要 |
PROBLEM TO BE SOLVED: To align a substrate with a high throughput and to align a substrate to an exposure position upon exposure with high accuracy.SOLUTION: A CD bar is disposed below an alignment system (AL1, AL2to AL2) in such a manner that a mark M of the CD bar 46 is detected in each of a plurality of detection regions so as to acquire relative position information of the plurality of detection regions of the alignment system. A drive system of a stage WST is controlled in such a manner that a wafer is relatively moved in a Y direction with respect to the plurality of detection regions so as to detect the plurality of marks at different positions with regard to the Y direction by at least a part of the plurality of detection regions of the alignment system. In an exposure operation of the wafer, relative position information of the plurality of detection regions and detection information of the alignment system are used; and in each of a detection operation and an exposure operation by the alignment system, position information of the stage is measured by an encoder system.SELECTED DRAWING: Figure 30 |
