IMAGING DEVICES WITH DUMMY PATTERNS

摘要

An imaging device is provided. The imaging device includes a plurality of photoelectric conversion elements fromed on a substrate in an active area. A microlens structure is disposed above the photoelectric conversion elements. A dummy pattern having a plurality of protruding elements is disposed above the substrate in a peripheral area surrounding the active area. Furthermore, a passivation film is conformally formed on the microlens structure and the dummy pattern. The passivation film on the tops of the protruding elements of the dummy pattern has a surface area smaller than a surface area of the peripheral area outside of the microlens structure.

主权项

1. An imaging device, comprising:
a plurality of photoelectric conversion elements formed on a substrate in an active area of the imaging device; a microlens structure disposed above the photoelectric conversion elements; a dummy pattern disposed above the substrate in a peripheral area of the imaging device surrounding the active area; and a passivation film conformally formed on the microlens structure and the dummy pattern, wherein the passivation film on a top of the dummy pattern has a surface area smaller than a surface area of the peripheral area outside of the microlens structure.