发明名称 ELECTROMECHANICAL DEVICES AND METHODS FOR FABRICATION OF THE SAME
摘要 A fabricated electromechanical device is disclosed herein. An exemplary device includes, a substrate, at least one layer of a high-transconductance material separated from the substrate by a dielectric medium, a first electrode in electrical contact with the at least one layer of a high-transconductance material and separated from the substrate by at least one first supporting member, a second electrode in electrical contact with the layer of a high-transconductance material and separated from the substrate by at least one second supporting member, where the first electrode is electrically separate from the second electrode, and a third electrode separated from the at least one layer of high-transconductance material by a dielectric medium and separated from each of the first electrode and the second electrode by a dielectric medium.
申请公布号 US2016052783(A1) 申请公布日期 2016.02.25
申请号 US201514809934 申请日期 2015.07.27
申请人 The Trustees of Columbia University in The City of New York 发明人 Rosenblatt Sami;Hone James;Chen Changyao
分类号 B81C1/00 主分类号 B81C1/00
代理机构 代理人
主权项 1. A method for fabricating an electromechanical device comprising: depositing a first layer of etchable material on a substrate; depositing at least one layer of graphene on the etchable material; depositing a first electrode on the etchable material such that at least a first portion of the at least one layer of graphene is covered by the first electrode and at least a portion of the first electrode is directly in contact with the etchable material; depositing a second electrode on the etchable material such that at least a second portion of the at least one layer of graphene is covered by the second electrode and at least a portion of the second electrode is directly in contact with the etchable material; and exposing the etchable material to an etchant to remove the etchable material around the first and second electrodes and underneath the at least one layer of graphene, thereby fabricating a device having the at least one layer of graphene suspended above the substrate.
地址 New York NY US