发明名称 TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME
摘要 The present invention relates to a transistor and a method for manufacturing the same. The transistor according to an embodiment of the present invention includes a substrate, a drain electrode formed on the substrate, a source electrode formed on the substrate and spaced apart from the drain electrode, a channel layer formed on the substrate and including a channel region electrically connecting the drain electrode and the source electrode to each other, a gate electrode formed on the substrate and spaced apart from the channel region, and a liquid crystal layer formed on the substrate to connect the channel layer and the gate electrode to each other.
申请公布号 US2016056395(A1) 申请公布日期 2016.02.25
申请号 US201514678806 申请日期 2015.04.03
申请人 Kyungpook National University Industry-Academic Cooperation Foundation 发明人 KIM Youngkyoo;SEO Jooyeok;KIM Hwajeong
分类号 H01L51/00;H01L51/10;C09K19/12;H01L51/05 主分类号 H01L51/00
代理机构 代理人
主权项 1. A transistor comprising: a substrate; a drain electrode on the substrate; a source electrode on the substrate, the source electrode being spaced apart from the drain electrode; a channel layer on the substrate, the channel layer comprising a channel region electrically connecting the drain electrode and the source electrode to each other; a gate electrode on the substrate, the gate electrode being spaced apart from the channel region; and a liquid crystal layer on the substrate, the liquid crystal layer connecting the channel layer and the gate electrode to each other.
地址 Daegu KR
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