发明名称 |
TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
The present invention relates to a transistor and a method for manufacturing the same. The transistor according to an embodiment of the present invention includes a substrate, a drain electrode formed on the substrate, a source electrode formed on the substrate and spaced apart from the drain electrode, a channel layer formed on the substrate and including a channel region electrically connecting the drain electrode and the source electrode to each other, a gate electrode formed on the substrate and spaced apart from the channel region, and a liquid crystal layer formed on the substrate to connect the channel layer and the gate electrode to each other. |
申请公布号 |
US2016056395(A1) |
申请公布日期 |
2016.02.25 |
申请号 |
US201514678806 |
申请日期 |
2015.04.03 |
申请人 |
Kyungpook National University Industry-Academic Cooperation Foundation |
发明人 |
KIM Youngkyoo;SEO Jooyeok;KIM Hwajeong |
分类号 |
H01L51/00;H01L51/10;C09K19/12;H01L51/05 |
主分类号 |
H01L51/00 |
代理机构 |
|
代理人 |
|
主权项 |
1. A transistor comprising:
a substrate; a drain electrode on the substrate; a source electrode on the substrate, the source electrode being spaced apart from the drain electrode; a channel layer on the substrate, the channel layer comprising a channel region electrically connecting the drain electrode and the source electrode to each other; a gate electrode on the substrate, the gate electrode being spaced apart from the channel region; and a liquid crystal layer on the substrate, the liquid crystal layer connecting the channel layer and the gate electrode to each other. |
地址 |
Daegu KR |