METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD

摘要

A method for manufacturing a liquid discharge head. The method includes a first step of forming a telecentric measurement pattern A by exposure, the telecentric measurement pattern A being part of a measurement pattern that allows determination of inclination of a principal ray caused by an off-axis telecentric degree occurring in a projection exposing device, and a second step of forming a telecentric measurement pattern B by exposure under an exposure condition defocused from an exposure condition in the first step, the telecentric measurement pattern B being another part of the measurement pattern, which allows the determination of the inclination of the principal ray caused by the off-axis telecentric degree occurring in the projection exposing device. The off-axis telecentric degree is determined from an amount of misalignment between relative forming positions of the telecentric measurement patterns A and B and an amount of defocusing.

主权项

1. A method for manufacturing a liquid discharge head, the method including a step of forming a discharge port pattern at a layer containing a photosensitive resin material by exposure using a projection exposing device, the method comprising:
a first step of forming a telecentric measurement pattern A by exposure through a mask, the telecentric measurement pattern A being part of a measurement pattern that allows determination of inclination of a principal ray caused by an off-axis telecentric degree occurring in the projection exposing device; and a second step of forming a telecentric measurement pattern B by exposure through a mask under an exposure condition defocused from an exposure condition in the first step, the telecentric measurement pattern B being another part of the measurement pattern, which allows the determination of the inclination of the principal ray caused by the off-axis telecentric degree occurring in the projection exposing device, wherein the off-axis telecentric degree is determined from an amount of misalignment between relative forming positions of the telecentric measurement pattern A and the telecentric measurement pattern B and an amount of defocusing.