| 摘要 |
A method (200) for evaluating a lithographic system or component thereof is described. The method (200) comprises directing (204) electromagnetic radiation of a second wavelength or wavelength range, different from electromagnetic radiation of a first wavelength or wavelength range for lithographic processing in the lithographic system, to a lithographic optical element and detecting at least part of the electromagnetic radiation being reflected from the lithographic optical element at a substrate comprising a photosensitive layer, thereafter evaluating (205) the detected electromagnetic radiation, and determining (206) from the evaluation of the exposed photosensitive layer a topographical parameter of the lithographic optical element and/or a holder thereof. |
