| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad having uniform pores and suppressing shear droop at the end face. <P>SOLUTION: The polishing pad has a polishing layer formed of polyurethane foam obtained by mixing and stirring a urethane resin composite with low viscosity and a long pot life with unfoamed heat-expandable minute spherical bodies to be hardened and foaming the heat-expandable minute spherical bodies by heat of reaction, the maximum pore diameter of the polishing layer is 300 μm or below, and the average pore diameter is 130-170 μm. <P>COPYRIGHT: (C)2011,JPO&INPIT |
