Semiconductor equipment

摘要

Semiconductor equipment is disclosed in this invention. The semiconductor equipment includes a reaction chamber, a wafer susceptor, and a liner device. The reaction chamber includes an opening and a circular inner wall. The wafer susceptor is capable of carrying at least one wafer. The liner device is disposed between the wafer susceptor and the circular inner wall of the reaction chamber. The liner device is capable of moving vertically between a first position and a second position. The liner device includes at least one venting opening, wherein the venting opening is connected with a venting device. Particles which are accumulated within the liner device can be removed by the venting device.

主权项

1. A semiconductor equipment, comprising:
a reaction chamber, said reaction chamber having an opening and a circular inner wall; a wafer susceptor, said wafer susceptor being capable of carrying at least one wafer; a liner device, said liner device being disposed between said wafer susceptor and said circular inner wall of said reaction chamber, said liner device being capable of moving vertically between a first position and a second position, said liner device having an outer liner and at least one venting opening, said venting opening being connected with a venting device, wherein particles which are accumulated within said liner device can be removed by said venting device; and a movable table, wherein said liner device is disposed on said movable table and wherein said movable table further comprises at least one venting tube, said particles are transferred to said venting device through said venting tube, and wherein said venting tube connects said outer liner and said venting device.