发明名称 PLASMA-RESISTANT MEMBER AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a plasma-resistant member capable of reducing particles and also capable of stably maintaining a chamber condition.SOLUTION: There is provided a plasma-resistant member. The plasma-resistant member includes a base material; and a layer structure formed on a surface of the base material by an aerosol deposition method, including polycrystalline yttria and having plasma resistance. The polycrystalline yttria constituting the layer structure has a crystal structure comprising a mixture of a cubic crystal and a monoclinic crystal. The proportion of the monoclinic crystal to the cubic crystal in the polycrystalline yttria constituting the layer structure is 0% or more and 60% or less, and the polycrystalline yttria constituting the layer structure has a crystallite size of 8 nm or more and 50 nm or less.SELECTED DRAWING: Figure 1
申请公布号 JP2016027624(A) 申请公布日期 2016.02.18
申请号 JP20150114150 申请日期 2015.06.04
申请人 TOTO LTD 发明人 IWAZAWA JUNICHI
分类号 H01L21/3065;C23C24/04 主分类号 H01L21/3065
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