| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern having good CD (critical dimension) uniformity and fewer defects can be produced.SOLUTION: The resist composition includes: (A) a resin having a structural unit expressed by formula (I), which is insoluble or poorly soluble with an alkali aqueous solution and can dissolve in an alkali aqueous solution by the action of an acid; (B) an acid generator; and (D) a compound expressed by formula (II). In the formulae, ring Trepresents a sultone ring optionally having a substituent; Xrepresents an alkane diyl group; and Xrepresents an oxygen atom or the like. |
