发明名称 |
Cell having shifted boundary and boundary-shift scheme |
摘要 |
An embodiment cell shift scheme includes abutting a first transistor cell against a second transistor cell and shifting a place and route boundary away from a polysilicon disposed between the first transistor cell and the second transistor cell. In an embodiment, the cell shift scheme includes shifting the place and route boundary to prevent a mismatch between a layout versus schematic (LVS) netlist and a post-simulation netlist. |
申请公布号 |
US9262573(B2) |
申请公布日期 |
2016.02.16 |
申请号 |
US201313791406 |
申请日期 |
2013.03.08 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Yang Kuo-Nan;Lin Chou-Kun;Kao Jerry Chang-Jui;Tsai Yi-Chuin;Chao Chien-Ju;Wang Chung-Hsing |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
Slater & Matsil, L.L.P. |
代理人 |
Slater & Matsil, L.L.P. |
主权项 |
1. A method comprising:
abutting a first transistor cell against a second transistor cell, a polysilicon feature extending from the first transistor cell to the second transistor cell; shifting a place and route boundary between the first transistor cell and the second transistor cell away from the polysilicon feature, thereby defining a modified first transistor cell and a modified second transistor cell; creating a netlist comprising the modified first transistor cell and the modified second transistor cell, the netlist comprising a device associated with the polysilicon feature; and shifting, by a computer, the place and route boundary to prevent a mismatch between a layout versus schematic (LVS) netlist and a post-simulation netlist. |
地址 |
Hsin-Chu TW |