发明名称 Cell having shifted boundary and boundary-shift scheme
摘要 An embodiment cell shift scheme includes abutting a first transistor cell against a second transistor cell and shifting a place and route boundary away from a polysilicon disposed between the first transistor cell and the second transistor cell. In an embodiment, the cell shift scheme includes shifting the place and route boundary to prevent a mismatch between a layout versus schematic (LVS) netlist and a post-simulation netlist.
申请公布号 US9262573(B2) 申请公布日期 2016.02.16
申请号 US201313791406 申请日期 2013.03.08
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Yang Kuo-Nan;Lin Chou-Kun;Kao Jerry Chang-Jui;Tsai Yi-Chuin;Chao Chien-Ju;Wang Chung-Hsing
分类号 G06F17/50 主分类号 G06F17/50
代理机构 Slater & Matsil, L.L.P. 代理人 Slater & Matsil, L.L.P.
主权项 1. A method comprising: abutting a first transistor cell against a second transistor cell, a polysilicon feature extending from the first transistor cell to the second transistor cell; shifting a place and route boundary between the first transistor cell and the second transistor cell away from the polysilicon feature, thereby defining a modified first transistor cell and a modified second transistor cell; creating a netlist comprising the modified first transistor cell and the modified second transistor cell, the netlist comprising a device associated with the polysilicon feature; and shifting, by a computer, the place and route boundary to prevent a mismatch between a layout versus schematic (LVS) netlist and a post-simulation netlist.
地址 Hsin-Chu TW