Method for coincident alignment of a laser beam and a charged particle beam

摘要

A method and apparatus for aligning a laser beam coincident with a charged particle beam. The invention described provides a method for aligning the laser beam through the center of an objective lens and ultimately targeting the eucentric point of a multi-beam system. The apparatus takes advantage of components of the laser beam alignment system being positioned within and outside of the vacuum chamber of the charged particle system.

主权项

1. A multi-beam system, comprising:
a vacuum chamber; a workpiece support for supporting a workpiece within the vacuum chamber; a charged particle beam system for generating a beam of charged particles, said beam directed toward the workpiece; a laser beam system for generating a laser beam for processing the workpiece in the vacuum chamber; a focused ion beam system for generating a focused ion beam; an electron beam system for monitoring the material removal process; an objective lens; a laser beam alignment system that allows for the laser beam to be made through the center of the objective lens to target a eucentric point of the workpiece.