发明名称 |
PLASMA DEVICE |
摘要 |
A plasma device is proposed, the plasma device including: a chamber configured to accommodate a processed article; a plasma source configured to generate a plasma applied to the processed article accommodated in the chamber; a chuck unit configured to support the processed article accommodated in the chamber; and a cooling channel formed inside the chamber to allow flowing cooling water. |
申请公布号 |
US2016042923(A1) |
申请公布日期 |
2016.02.11 |
申请号 |
US201514820178 |
申请日期 |
2015.08.06 |
申请人 |
SUH Kee Won;ALLIED TECHFINDERS CO., LTD. |
发明人 |
SUH Kee Won |
分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
代理机构 |
|
代理人 |
|
主权项 |
1. A plasma device, the plasma device comprising:
a chamber configured to accommodate a processed article; a plasma source configured to generate a plasma applied to the processed article accommodated in the chamber; a chuck unit configured to support the processed article accommodated in the chamber; and a cooling channel formed inside the chamber to allow flowing cooling water. |
地址 |
Suwon-si KR |