发明名称 PLASMA DEVICE
摘要 A plasma device is proposed, the plasma device including: a chamber configured to accommodate a processed article; a plasma source configured to generate a plasma applied to the processed article accommodated in the chamber; a chuck unit configured to support the processed article accommodated in the chamber; and a cooling channel formed inside the chamber to allow flowing cooling water.
申请公布号 US2016042923(A1) 申请公布日期 2016.02.11
申请号 US201514820178 申请日期 2015.08.06
申请人 SUH Kee Won;ALLIED TECHFINDERS CO., LTD. 发明人 SUH Kee Won
分类号 H01J37/32 主分类号 H01J37/32
代理机构 代理人
主权项 1. A plasma device, the plasma device comprising: a chamber configured to accommodate a processed article; a plasma source configured to generate a plasma applied to the processed article accommodated in the chamber; a chuck unit configured to support the processed article accommodated in the chamber; and a cooling channel formed inside the chamber to allow flowing cooling water.
地址 Suwon-si KR