| 发明名称 |
ELECTRON BEAM PLASMA SOURCE WITH ROTATING CATHODE, BACKSIDE HELIUM
COOLING AND LIQUID COOLED PEDESTAL FOR UNIFORM PLASMA GENERATION |
| 摘要 |
A plasma reactor has an electron beam source as a plasma source and a rotation motor coupled to rotate the workpiece support about a rotation axis that is transverse to an emission path of said electron beam source. |
| 申请公布号 |
US2016042961(A1) |
申请公布日期 |
2016.02.11 |
| 申请号 |
US201414453023 |
申请日期 |
2014.08.06 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
Dorf Leonid;Tavassoli Hamid;Collins Kenneth S.;Ramaswamy Kartik;Carducci James D.;Rauf Shahid D.;Fovell Richard;Silveira Fernando M.;Markovsky Mark |
| 分类号 |
H01L21/3065;H01J37/32 |
主分类号 |
H01L21/3065 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A plasma reactor for processing a workpiece, comprising:
a chamber and a workpiece support in said chamber having a workpiece support surface, said chamber comprising a ceiling facing said workpiece support surface; a process gas source having a gas flow path to an interior of said chamber; an electron beam source having an electron beam emission path overlying said workpiece support surface; and a rotation motor coupled to said workpiece support, said workpiece support being rotatable about a rotation axis that is transverse to said electron beam emission path. |
| 地址 |
Santa Clara CA US |
