PLASMA GENERATION CHAMBER WITH SMOOTH PLASMA RESISTANT COATING

摘要

A faceplate or a selectivity modulation device (SMD) for a plasma generation chamber has a plasma resistant ceramic coating on a surface of the faceplate or SMD, wherein the plasma resistant ceramic coating comprises a thickness of less than approximately 30 microns, a porosity of less than 1% and a thickness non-uniformity of less than 4%.

主权项

1. A plasma generation chamber comprising:
a faceplate having a first plasma resistant ceramic coating on a surface of the faceplate, wherein the first plasma resistant ceramic coating comprises a thickness of less than approximately 30 microns, a porosity of less than 1% and a thickness non-uniformity of less than 4%; a selectivity modulation device (SMD) having a second plasma resistant ceramic coating on a surface of the SMD, wherein the second plasma resistant ceramic coating comprises a thickness of less than approximately 30 microns, a porosity of less than 1% and a thickness non-uniformity of less than 4%; and a dielectric separator separating the faceplate from the selectivity modulation device; wherein the plasma generation chamber is to generate plasma for a processing chamber by accelerating radicals from the faceplate toward the SMD and through a plurality of holes in the SMD.