| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve the problem that a measuring method other than a scatterometry method needs to be applied when a best-matched spectrum cannot be extracted from a library. <P>SOLUTION: The pattern measuring method includes the steps of: making light for measurement incident on a first striped pattern including a plurality of first linear patterns of an object to be measured having the first striped pattern formed therein on a parallel incidence condition, and acquiring a first spectrum of reflected light; analyzing the first spectrum, and thereby estimating a first physical quantity relating to a structure of a base of the first striped pattern and obtaining a first estimated value; forming a second striped pattern including a plurality of second linear patterns on the surface of the object to be measured, making light for measurement incident on the second striped pattern on a vertical incidence condition, and acquiring a second spectrum of reflected light; and analyzing the second spectrum on the basis of the first estimated value, and thereby estimating a second physical quantity relating to the cross-sectional shape of the second striped pattern and obtaining a second estimated value. <P>COPYRIGHT: (C)2013,JPO&INPIT |
