发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 A method for manufacturing a semiconductor device includes irradiating light to an effective region of a semiconductor substrate. A wavelength of the light is a wavelength adapted so that light absorptance of the semiconductor substrate increases if an intensity of the light increases. The light is irradiated so that a focus point of the light is made within the semiconductor substrate in the irradiating.
申请公布号 EP2657958(B1) 申请公布日期 2016.02.10
申请号 EP20100859503 申请日期 2010.11.10
申请人 TOYOTA JIDOSHA KABUSHIKI KAISHA 发明人 TANIDA ATSUSHI
分类号 H01L21/336;H01L21/268;H01L21/322;H01L21/76;H01L27/04;H01L29/06;H01L29/739;H01L29/78;H01L29/861 主分类号 H01L21/336
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