Side pad design for edge pedestal

摘要

A method and apparatus for facilitating equalized conditioning of a polishing surface of a polishing pad is described. The apparatus includes an extension device coupled to a base adjacent a peripheral edge of a polishing pad that is adapted to support a conditioning device, the extension device includes a body that is movable relative to the polishing pad, and a sacrificial pad comprising a polishing material coupled to a mounting surface of the body.

主权项

1. An apparatus, comprising:
a base having a rotatable polishing pad coupled to an upper surface thereof, the polishing pad having a polishing surface and a peripheral edge; a carrier head adapted to retain a substrate; a conditioning device adapted to move relative to the polishing surface in a sweep pattern that extends beyond the peripheral edge; and an extension device coupled to the base adjacent the peripheral edge of the polishing pad and adapted to support the conditioning device when the conditioning device in at least a portion of the sweep pattern, the extension device comprising:
a body that is movable relative to the polishing pad; anda sacrificial pad comprising a polishing material coupled to a mounting surface of the body, wherein one or both of the body and sacrificial pad includes an indexing feature.