Drying apparatus with exhaust control cap for semiconductor wafers and associated methods

摘要

A drying apparatus for drying a semiconductor wafer includes a processing chamber including a rinsing section and a drying section adjacent thereto. The rinsing section has a chamber loading slot associated therewith for receiving the semiconductor wafer. The drying section has a chamber unloading slot associated therewith for outputting the semiconductor wafer. An exhaust control cap is carried by the processing chamber and includes a bottom wall, a top wall, at least one intermediate wall between the bottom and top walls, and a side wall coupled to the top, bottom and the at least one intermediate wall to define stacked exhaust sections. The exhaust control cap has a cap loading slot aligned with the chamber loading slot, a cap unloading slot aligned with the chamber unloading slot, and at least one exhaust port configured to be coupled to a vacuum source.

主权项

1. A drying apparatus for drying a semiconductor wafer comprising:
a processing chamber comprising a rinsing section and a drying section adjacent thereto, with the rinsing section having a chamber loading slot associated therewith for receiving the semiconductor wafer, and with the drying section having a chamber unloading slot associated therewith for outputting the semiconductor wafer; and an exhaust control cap carried by said processing chamber and comprising a bottom wall, a top wall, at least one intermediate wall between said bottom and top walls, and spaced apart outer side walls coupled to said top wall, said bottom wall and said at least one intermediate wall to define a plurality of stacked exhaust sections, with each stacked exhaust section extending between said spaced apart outer side walls, said exhaust control cap having
a cap loading slot extending through said bottom wall, said top wall, and said at the least one intermediate wall and aligned with the chamber loading slot,a cap unloading slot extending through said bottom wall, said top wall, and said at the least one intermediate wall and aligned with the chamber unloading slot, andat least one exhaust port in one of said outer side walls and configured to be coupled to a vacuum source.