| 摘要 |
PROBLEM TO BE SOLVED: To keep a lithography margin of a layout which arrangement of an auxiliary pattern is difficult.SOLUTION: A mask data preparation device comprises: an auxiliary pattern arrangement unit adding an auxiliary pattern to a main pattern formed on a substrate; a transcription determination unit inspecting that the auxiliary pattern is not copied on the substrate; and a pattern calibration unit cutting from an appointed position of a long side direction of a rectangular auxiliary pattern to cross a short side of the rectangular auxiliary pattern when a size of the short side of the rectangular auxiliary pattern in the auxiliary pattern which may be copied on the substrate is less than an appointed standard, and dividing the rectangular auxiliary pattern.SELECTED DRAWING: Figure 1 |
