| 摘要 |
PROBLEM TO BE SOLVED: To provide a contact connection method and a contact connection structure capable of reducing contact resistance, without up-sizing the terminal and without complicating the structure as much as possible.SOLUTION: A contact connection structure includes a first contact 31 having an elastic flexure 31a, and a plating layer C formed on the surface, and a second contact 51 having a plating layer C formed on the surface. The elastic flexure 31a of the first contact 31 slides on the contact surface of the second contact 51, and at the terminal insertion completion position, the contact part 31b of the elastic flexure 31a presses the second contact 51, and comes into contact therewith. The plating layer C is made to intrude between an oxide film D destroyed when inserting the terminal, by lowering the pressure at the peripheral environment of the first contact 31 and second contact 51 below the atmospheric pressure.SELECTED DRAWING: Figure 11 |
