发明名称 SUBSTRATE SUPPORT DEVICE AND EXPOSURE DEVICE
摘要 Provided are: a substrate base provided with a surface for supporting, in a flat state or a curved state having a prescribed curve, a flexible and transmissive substrate to be optically treated; and a film formed on the surface of the substrate base and having a reflectance of 50% or less in relation to the light (ultraviolet rays for exposure, visible light for alignment, etc.) used in the optical treatment.
申请公布号 HK1207694(A1) 申请公布日期 2016.02.05
申请号 HK20150108377 申请日期 2015.08.28
申请人 NIKON CORPORATION 发明人 MASAKI KATO;YOSHIAKI KITO;MASAKAZU HORI;TOHRU KIUCHI
分类号 G03F;H01L 主分类号 G03F
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