| 摘要 |
Provided is an arc evaporation source, which is for melting and evaporating a cathode material by arc discharge in a vacuum and forming a film on the surface of a substrate and which is equipped with a cathode that is formed roughly in a disc shape and a magnetic field-generating means disposed on the back side of the cathode. The magnetic field-generating means is configured so as to generate a magnetic field which forms, by means of at least one permanent magnet disposed on the back surface of the cathode with the magnetic pole oriented in a direction that is 20°-50° with respect to the discharge surface of the cathode, magnetic lines that form an acute angle with respect to the direction of the substrate at the outer circumferential surface of the cathode, magnetic lines that are substantially perpendicular to the discharge surface at the most peripheral section of the cathode discharge surface, and magnetic lines that form an acute angle with respect to the direction of the cathode center in the region towards the outer circumferential surface of the cathode discharge surface. The arc evaporation source allows a cathode to be utilized fully to the periphery thereof and is able to dramatically increase cathode material utilization efficiency. |
