发明名称 |
FILM FORMATION METHOD AND FILM FORMATION APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To increase thin film pattern formation accuracy.SOLUTION: A film formation method includes the steps of: applying a liquid film formation material 16 to a display surface 4a of a display panel 4 from the side of a metal mask 6 while heating the metal mask 6 in the state of bringing the metal mask 6 into intimate contact with the display surface 4a of the display panel 4; and forming a thin film pattern by heating and burning the applied liquid film formation material 16.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016019937(A) |
申请公布日期 |
2016.02.04 |
申请号 |
JP20140143972 |
申请日期 |
2014.07.14 |
申请人 |
V TECHNOLOGY CO LTD |
发明人 |
KAJIYAMA KOICHI;MIZUMURA MICHINOBU |
分类号 |
B05D1/32;B05B15/04;B05C9/14;H05K3/12 |
主分类号 |
B05D1/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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