发明名称 FILM FORMATION METHOD AND FILM FORMATION APPARATUS
摘要 PROBLEM TO BE SOLVED: To increase thin film pattern formation accuracy.SOLUTION: A film formation method includes the steps of: applying a liquid film formation material 16 to a display surface 4a of a display panel 4 from the side of a metal mask 6 while heating the metal mask 6 in the state of bringing the metal mask 6 into intimate contact with the display surface 4a of the display panel 4; and forming a thin film pattern by heating and burning the applied liquid film formation material 16.SELECTED DRAWING: Figure 1
申请公布号 JP2016019937(A) 申请公布日期 2016.02.04
申请号 JP20140143972 申请日期 2014.07.14
申请人 V TECHNOLOGY CO LTD 发明人 KAJIYAMA KOICHI;MIZUMURA MICHINOBU
分类号 B05D1/32;B05B15/04;B05C9/14;H05K3/12 主分类号 B05D1/32
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