| 摘要 |
PROBLEM TO BE SOLVED: To reduce positional deviation of a mold in a holding section for holding the mold.SOLUTION: An imprint device for patterning on a substrate by molding an imprint material on the substrate has a holding section for holding the mold, a plurality of contact parts that can come into contact with the side face of the mold held by the holding section, a plurality of actuators for giving force to the side face via the contact part in contact with the side face by moving each of contact parts, a plurality of measurement sections for moving each of contact parts by the plurality of actuators, and measuring the travels of the plurality of contact parts from respective reference positions until coming into contact the side face, and a control section for moving the mold held by the holding section via the contact parts by each of actuators, based on the travels measured by the plurality of measurement sections.SELECTED DRAWING: Figure 3 |
