SUBSTRATE TARGET FOR IN-SITU LITHOGRAPHY METROLOGY, METROLOGY METHOD FOR IN-SITU LITHOGRAPHY, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING IN-SITU METROLOGY

摘要

A substrate can include a feature pattern included in an integrated circuit on the substrate and an in-situ metrology pattern spaced apart from the feature pattern on the substrate, the in-situ metrology pattern and the feature pattern both configured to have equal heights relative to a surface of the substrate.

主权项

1. A substrate target for lithography metrology comprising:
a substrate; a feature pattern on the substrate; and a SubWavelength Grating (SWG) key on a same level relative to the substrate as the feature pattern, the SWG key comprising a plurality of diffraction patterns spaced apart at a first pitch that is configured to measure a focal variation affecting formation of the feature pattern.