METHOD FOR MANUFACTURING SUBSTRATE AND MANUFACTURING APPARATUS USED THE SAME

摘要

The present invention discloses a substrate manufacturing method and a substrate manufacturing apparatus used for the same. The method may include the steps of: providing a substrate having a mask layer into a chamber; inducing a plasma reaction in the chamber; alternately providing a first gas and a second gas into the chamber, and etching the substrate exposed from the mask layer. Whenever each of the first gas and the second gas is provided into the chamber, each gas can be supplied at a stabilized supply pressure without the fluctuation of a cross-feed pressure pulse of the first gas and the second gas.