发明名称 Semiconductor substrate and semiconductor chip
摘要 A semiconductor substrate capable of detecting operating current of a MOSFET and diode current in a miniaturized MOSFET such as a trench-gate type MOSFET is provided. A semiconductor substrate includes a main current region and a current sensing region in which current smaller than main current flowing in the main current region flows. The main current region has a source electrode disposed on a main surface, the source electrode being in contact with a p-type semiconductor region (body) and an n+-type semiconductor region (source), and the current sensing region has a MOSFET current detecting electrode and a diode current detecting electrode on a main surface, the MOSFET current detecting electrode being in contact with the p-type semiconductor region (body) and the n+-type semiconductor region (source), the diode current detecting electrode being in contact with the p-type semiconductor region (body).
申请公布号 US9252137(B2) 申请公布日期 2016.02.02
申请号 US201414474384 申请日期 2014.09.02
申请人 Renesas Electronics Corporation 发明人 Hashimoto Takayuki
分类号 H01L29/861;H01L25/16;H01L23/495;H01L25/07;H01L29/739;H01L27/06;H01L23/00 主分类号 H01L29/861
代理机构 Mattingly & Malur, PC 代理人 Mattingly & Malur, PC
主权项 1. A semiconductor device in one package comprising: a first switching device; a second switching device, the first switching device and the second switching device being connected in series between a voltage input terminal and a reference voltage terminal; and a driving circuit that complementarily drives the first switching device and the second switching device, wherein the second switching device is composed of a semiconductor substrate including: a first semiconductor region on a main surface of a substrate,a second semiconductor region formed in the first semiconductor region and having a conductivity opposite to that of the first semiconductor region,a third semiconductor region formed in the second semiconductor region and having the same conductivity as the first semiconductor region,a plurality of grooves formed in the first semiconductor region, the second semiconductor region, and the third semiconductor region and extending in a first direction on the main surface of the substrate,a first insulating film formed in the grooves, anda first conductor formed on the first insulating film,wherein the semiconductor substrate has a main current region and a current detecting region in which current smaller than main current flowing in the main current region flows,wherein the main current region has a second conductor disposed on a main surface of the main current region, the second conductor being in contact with the second semiconductor region and the third semiconductor region, and wherein the current detecting region has a third conductor and a fourth conductor disposed on a main surface of the current detecting region, the third conductor being in direct contact with the second semiconductor region and the third semiconductor region, and the fourth conductor being in direct contact with the second conductor; wherein the second switching device further includes at least four pads including a gate pad, a source pad, a current detecting pad, and a body diode current detecting pad, wherein the gate pad, the source pad, the current detecting pad, and the body diode current detecting pad are connected to the first conductor, the second conductor, the third conductor, and the fourth conductor of the semiconductor substrate, respectively, and wherein the driving circuit and the at least four pads are connected by bonding wires.
地址 Tokyo JP