Positive resist composition and patterning process

摘要

A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of 2-pyrone ester, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.

主权项

1. A positive resist composition comprising a polymer comprising recurring units having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and recurring units (a) having a 2-pyrone ester, represented by the general formula (1), and having a weight average molecular weight of 1,000 to 500,000 as a base resin, wherein R1 is hydrogen or methyl, R2 is methyl or ethyl, and X is (1) a single bond, (2) a C1-C12 linking group having an ester radical, ether radical or lactone ring, (3) phenylene group or (4) naphthylene group.