发明名称 Chemical bath deposition (CBD) apparatus
摘要 A chemical bath deposition (CBD) apparatus includes a first cap, a second cap, and a solution input/output device. The second cap is arranged corresponding to the first cap so as to form a deposition space. The solution input/output device is located in the first cap so as to feed a solution into/out of the deposition space. The position of the solution input/output device is fixed, or the solution input/output device is movable in the deposition space.
申请公布号 US9249507(B2) 申请公布日期 2016.02.02
申请号 US201213452933 申请日期 2012.04.23
申请人 Industrial Technology Research Institute 发明人 Hsu Wei-Tse;Hsieh Tung-Po;Tsai Song-Yeu
分类号 B05C3/02;B05C3/04;B05B1/00;C23C18/12 主分类号 B05C3/02
代理机构 Jianq Chyun IP Office 代理人 Jianq Chyun IP Office
主权项 1. A chemical bath deposition (CBD) apparatus, comprising: a first cap and a second cap, wherein the second cap is arranged corresponding to the first cap so as to form a deposition space, and an outer edge of the first cap has an extension portion, configured to provide a height of the deposition space; and a solution input/output device located in the first cap, wherein the solution input/output device is configured to move within the deposition space, and the solution input/output device comprises: at least one aim, connected to the extension portion of the first cap, wherein the arm is configured to perform stretching motion;at least one solution injection chamber, connecting the arm; andat least one solution pipe, located in the arm, wherein the solution pipe is configured to supply a fluid to the solution injection chamber.
地址 Hsinchu TW