发明名称 |
Chemical bath deposition (CBD) apparatus |
摘要 |
A chemical bath deposition (CBD) apparatus includes a first cap, a second cap, and a solution input/output device. The second cap is arranged corresponding to the first cap so as to form a deposition space. The solution input/output device is located in the first cap so as to feed a solution into/out of the deposition space. The position of the solution input/output device is fixed, or the solution input/output device is movable in the deposition space. |
申请公布号 |
US9249507(B2) |
申请公布日期 |
2016.02.02 |
申请号 |
US201213452933 |
申请日期 |
2012.04.23 |
申请人 |
Industrial Technology Research Institute |
发明人 |
Hsu Wei-Tse;Hsieh Tung-Po;Tsai Song-Yeu |
分类号 |
B05C3/02;B05C3/04;B05B1/00;C23C18/12 |
主分类号 |
B05C3/02 |
代理机构 |
Jianq Chyun IP Office |
代理人 |
Jianq Chyun IP Office |
主权项 |
1. A chemical bath deposition (CBD) apparatus, comprising:
a first cap and a second cap, wherein the second cap is arranged corresponding to the first cap so as to form a deposition space, and an outer edge of the first cap has an extension portion, configured to provide a height of the deposition space; and a solution input/output device located in the first cap, wherein the solution input/output device is configured to move within the deposition space, and the solution input/output device comprises:
at least one aim, connected to the extension portion of the first cap, wherein the arm is configured to perform stretching motion;at least one solution injection chamber, connecting the arm; andat least one solution pipe, located in the arm, wherein the solution pipe is configured to supply a fluid to the solution injection chamber. |
地址 |
Hsinchu TW |