发明名称 |
Skin treatment devices and methods with pre-stressed configurations |
摘要 |
Devices, bandages, kits and methods are described that can control or regulate the mechanical environment of a wound to ameliorate scar and/or keloid formation. The mechanical environment of a wound includes stress, strain, and any combination of stress and strain. The control of a wound's mechanical environment can be active, passive, dynamic, or static. The devices are configured to be removably secured to a skin surface in proximity to the wound site and shield the wound from endogenous and/or exogenous stress. |
申请公布号 |
US9248051(B2) |
申请公布日期 |
2016.02.02 |
申请号 |
US201313789237 |
申请日期 |
2013.03.07 |
申请人 |
The Board of Trustees of the Leland Stanford Junior University |
发明人 |
Gurtner Geoffrey C.;Dauskardt Reinhold H.;Longaker Michael T.;Yock Paul |
分类号 |
A61F13/02;A61F13/00;A61K47/48;B82Y5/00;C07K5/062;C07K5/072;C07K5/083;C07K5/103;C07K7/02;C07K9/00;G01N33/574;A61K38/00 |
主分类号 |
A61F13/02 |
代理机构 |
Morrison & Foerster LLP |
代理人 |
Morrison & Foerster LLP |
主权项 |
1. A system to ameliorate the formation of scars, comprising:
a polymeric layer and an adhesive thereon, wherein the adhesive is configured to removably adhere the polymeric layer to an epidermal skin surface, wherein the polymeric layer is configured to have a stressed configuration and a relaxed configuration; wherein the polymeric layer is strained to a predetermined strain level in the stressed configuration, and a release structure configured to maintain the predetermined strain of the stressed configuration in the polymeric layer prior to securing the polymeric layer to an epidermal skin surface and configured to be manipulated to release strain from the polymeric layer. |
地址 |
Palo Alto CA US |