| 发明名称 |
SUBSTRATE WITH ANTIREFLECTION LAYER |
| 摘要 |
The present invention provides a substrate with an antireflection layer not only which is excellent in the antireflection properties but also which has high water repellency and oil repellency and favorable oil and fat stain removability, and a display device provided with a substrate with an antireflection layer.;A substrate with an antireflection layer, which comprises an antireflection layer on at least one surface of the substrate,
wherein the antireflection layer contains a silica porous film having fluorinated organic groups, andthe surface of the antireflection layer on the opposite side from the substrate has an element number ratio F/Si of at least 1 as obtained from the peak height of F1s and the peak height of Si2p in surface analysis by scanning X-ray photoelectron spectroscopy (ESCA) and has an arithmetic mean roughness (Sa) of at most 3.0 nm. |
| 申请公布号 |
US2016025899(A1) |
申请公布日期 |
2016.01.28 |
| 申请号 |
US201514878054 |
申请日期 |
2015.10.08 |
| 申请人 |
ASAHI GLASS COMPANY, LIMITED |
发明人 |
ISHIZEKI Kenji;ISOBE Akira;HATANAKA Yuki;KAWAI Yohei;YONEDA Takashige;ABE Keisuke |
| 分类号 |
G02B1/111;C09D127/24;C09D5/00 |
主分类号 |
G02B1/111 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate with an antireflection layer, which comprises an antireflection layer on at least one surface of the substrate,
wherein the antireflection layer contains a silica porous film having fluorinated organic groups, and the surface of the antireflection layer on the opposite side from the substrate has an element number ratio F/Si of at least 1 as obtained from the peak height of F1s and the peak height of Si2p in surface analysis by scanning X-ray photoelectron spectroscopy (ESCA) and has an arithmetic mean roughness (Sa) of at most 3.0 nm. |
| 地址 |
Tokyo JP |
