发明名称 Ga2O3-BASED SINGLE CRYSTAL SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide stably with excellent reproducibility, a GaO-based single crystal substrate having excellent shapeability.SOLUTION: There is provided a GaO-based single crystal substrate in which TTV(T) of a principal surface is 10 μm or less, WARP of the principal surface is 25 μm or less, a half-value width of rocking curve measurement of X-ray diffraction is 17 seconds or less, and the addition ratio of Sn is 0.003-1.0 mol%.
申请公布号 JP2016013962(A) 申请公布日期 2016.01.28
申请号 JP20150096086 申请日期 2015.05.08
申请人 TAMURA SEISAKUSHO CO LTD;KOHA CO LTD 发明人 MASUI TAKEKAZU;KOSHI KIMIYOSHI;DOIOKA KEI;YAMAOKA MASARU
分类号 C30B29/16 主分类号 C30B29/16
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