| 摘要 |
CMP pads having novel groove configurations are described. For example, described herein are CMP pads comprising primary grooves, secondary grooves, a groove pattern center, and an optional terminal groove. The CMP pads may be made from polyurethane or poly (urethane-urea), and the grooves produced therein may be made by a method from the group consisting of molding, laser writing, water jet cutting, 3-D printing, thermoforming, vacuum forming, micro-contact printing, hot stamping, and mixtures thereof. |
| 主权项 |
1. A CMP pad, comprising:
a) primary grooves; and b) secondary grooves;wherein said primary grooves are radial and said secondary grooves transect sectors as defined, in part, by the primary grooves and wherein the primary grooves are selected from straight grooves, curved grooves, or any combinations or portions thereof and the secondary grooves are on-set or off-set sinusoidal waveform grooves, or portions thereof. |
