| 摘要 |
The objective of the present invention is to provide, in a remote plasma type film-forming treatment system, a radical gas generation system that is capable of performing a uniform treatment using a radical gas, even if, for example, the object to be treated has a large surface area. Then, in this radical gas generation system (500), a treatment chamber device (200) has a table (201) for rotating the object (202) to be treated. The radical gas generation device (100) has a plurality of electric discharge cells (70). In addition, each of the electric discharge cells (70) has an open portion (102), which communicates with the interior of the treatment chamber device (200), faces the object (202) to be treated, and sends out a radical gas (G2). Then, in a planar view, the farther from the rotation center position the discharge cell (70) is, the larger the facing surface area thereof becomes, which is a region wherein a first electrode member (1) and a second electrode member (31) are facing each other. |
