| 发明名称 |
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND COMPUTER-READABLE STORAGE MEDIUM STORED WITH SUBSTRATE PROCESSING PROGRAM |
| 摘要 |
Disclosed is a substrate processing apparatus (a substrate processing method, and a computer readable storage medium having a substrate processing program stored therein) of cleaning an etched substrate with a polymer removing liquid, in which any of isopropyl alcohol vapor, water vapor, deionized water and isopropyl alcohol, ammonia water, and ammonia water and isopropyl alcohol is supplied to the substrate before the substrate is cleaned with the polymer removing liquid. |
| 申请公布号 |
US2016027635(A1) |
申请公布日期 |
2016.01.28 |
| 申请号 |
US201514803421 |
申请日期 |
2015.07.20 |
| 申请人 |
Tokyo Electron Limited |
发明人 |
Okamura Naoyuki;Kosai Kazuki;Teraoka Kazuhiro;Kamimura Fumihiro |
| 分类号 |
H01L21/02;H01L21/67 |
主分类号 |
H01L21/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate processing method of cleaning an etched substrate with a polymer removing liquid,
wherein isopropyl alcohol vapor or water vapor is supplied to the substrate before the etched substrate is cleaned with the polymer removing liquid. |
| 地址 |
Tokyo JP |
