| 摘要 |
The present invention relates to an excellent photomask which is favorably suitable in an exposure environment of a mask used for a display device production, and is capable of stably transferring micropatterns. The present invention further relates to a production method thereof. The photomask comprises transferring patterns formed by patterning a specific low light-transmitting membrane and a specific semi-light- transmitting membrane deposited on a transparent substrate. The transferring pattern comprises: a main pattern including a light-transmitting part where the transparent substrate is exposed and having the diameter of W1 (μm); an auxiliary pattern positioned near the main pattern, including a semi-light-transmitting part where the semi-light-transmitting membrane is formed on the transparent substrate, and having a width of d (μm); and a low light-transmitting part positioned on a region of the transferring pattern where the main and the auxiliary pattern are not formed, and having at least one low light-transmitting membrane formed on the transparent substrate. Furthermore, in the photomask, the diameter of the main pattern W1, light-transmittance of the semi light-transmitting part T1, and the width d of the semi-light-transmitting part are correlated with each other. |
